Chapter II: Semiconductor products

The final or intermediate topography of a semiconductor product reflecting an intellectual effort by the creator may, unless it is commonplace, be the subject of a deposit conferring the protection provided for in this chapter. Such a deposit may not be made more than two years after the topography has first been commercially exploited anywhere or more than fifteen years after it has been fixed or encoded for the first…

The following are eligible for the benefits of this chapter: a) Creators who are nationals of a State party to the Agreement establishing the World Trade Organisation or who have in such a State either their habitual residence or a real and effective industrial or commercial establishment, as well as their successors in title ; b) Persons meeting the above conditions of nationality, residence or establishment, who proceed in a…

The right to the deposit belongs to the creator or his successor in title. If a deposit has been made in violation of the rights of the creator or his successor in title, the injured party may claim the benefit thereof. The action for reclaiming the rights is barred after five years from the date of publication of the filing.

The Director of the National Institute of Industrial Property registers the filing after examining its formal regularity. Publication is made under conditions laid down by decree in the Council of State.